机型 MODEL | NR 940 |
版材类型 Plate type | 阳图热敏 CTP 版材 Positive thermal CTP plate |
版材尺寸 Plate size | 宽度(W) MAX 940mm 长度(L) MIN 400mm |
版材厚度 Plate thickness | 0.12mm-0.40mm | 版材处理速度 Processing speed | 12-65s |
显影温度设定 Processing temperature range | 15℃-35℃ | 显影液升温速度 Developer heating time | 0.3℃/min |
显影液降温速度 Developer chilling time | | 0.2℃/min |
显影液补充系统 Chemicals replenishment system | 动态补充、静态补充、手动补充 Automatic chemical replenishment, Automatic anti-oxidation replenishment at starting, Manual replenishment |
显影槽容量 Developer tank capacity | 45升(L) |
胶水槽容量 Rinse tank capacity | 大于1升,循环使用 >1L Recirculation |
洪干温度设定 | Dry temperature range 30℃-65℃ |
显影毛刷转速 | Developing brush revolving speed 50-120rpm |
水洗毛刷转速 | Washing brush revolving speed 50-120rpm |
显影温度误差 | Processing temperature deviation ±0.5℃ |
电源 Electrical supply | 单相 220V AC 3.5KW |
若因需要而变更设计,恕不另行通告。 We peserve the right to change, design without notice. |